PhD Position: Hybrid PVD/ALD Multilayer Thin Film Deposition for Sustainable Aeronautics

This PhD position focuses on advancing dielectric thin film technology for high-voltage electronic devices in aeronautics, addressing climate change challenges. The project combines physical vapor deposition (PVD) and atomic layer deposition (ALD) to create multilayer nanolaminates, aiming to achieve unprecedented dielectric strength (>20 MV/cm) for future high-voltage power systems. The PhD candidate will split their time between the University of Nottingham (UK) and the University of Toulouse (France), optimizing deposition processes, characterizing materials, and evaluating electrical performance. The research targets sustainable aviation by enabling higher voltage converters, reducing reliance on fossil fuels. The position is funded under the MSCA COFUND BEST programme and offers a multidisciplinary collaboration between two leading research groups.

• Develop and optimize hybrid PVD/ALD multilayer thin film deposition processes for dielectric materials.
• Characterize film composition, structure, and electrical properties using advanced techniques (XPS, SEM, AFM, Raman spectroscopy, etc.).
• Conduct electrical breakdown and aging tests to evaluate long-term reliability of dielectric stacks.
• Collaborate with researchers at the University of Nottingham and Toulouse to integrate deposition and characterization workflows.
• Analyze defect propagation and failure mechanisms in dielectric films using multiscale diagnostic techniques.
• Present research findings at international conferences and publish results in peer-reviewed journals.
• Split time between Nottingham (18 months) and Toulouse (18 months) for process optimization and electrical testing.