Development of a Multidimensional Hydrodynamic-Radiative Model for Tin Plasmas in EUV Source Optimization

This PhD position focuses on advancing hydrodynamic-radiative modeling of tin plasmas to enhance the efficiency and performance of EUV light sources operating at 13.5 nm. The project is based in France and involves cutting-edge computational physics to address challenges in plasma dynamics and radiation. The successful candidate will contribute to optimizing EUV sources, which are critical for next-generation semiconductor lithography. The work combines theoretical modeling with experimental validation, requiring strong skills in plasma physics, computational methods, and interdisciplinary collaboration. The position offers a unique opportunity to work at the intersection of physics, engineering, and technology, with potential applications in advanced manufacturing and microelectronics.

• Develop and implement multidimensional hydrodynamic-radiative models for tin plasmas.
• Perform simulations to optimize EUV light sources operating at 13.5 nm.
• Collaborate with experimental teams to validate computational models with real-world data.
• Analyze and interpret simulation results to improve plasma behavior and radiation efficiency.
• Publish findings in peer-reviewed journals and present results at international conferences.
• Contribute to the development of advanced computational tools for plasma physics research.