Development of Advanced Electrode Materials via Atomic Layer Deposition for Ionic Devices
PhD position to develop ultrathin conductive layers (<10 nm) using Atomic Layer Deposition for high-performance ionic devices.
Best for:Best for materials science PhD candidates with expertise in Atomic Layer Deposition (ALD), thin-film characterization, and electrochemical analysis, seeking hands-on research in nanotechnology and device integration.
Overview
This PhD position at Montpellier SupAgro’s LETI laboratory focuses on advancing ultrathin conductive electrode materials via Atomic Layer Deposition (ALD). The project aims to reduce electrode layer thickness below 5 nm while maintaining low resistivity (mOhm range) and integrating these materials into 3D devices. The successful candidate will conduct research on ALD processes, precursor development, and characterization of physico-chemical, morphological, and electrochemical properties. The work spans fundamental materials science and applied device integration, offering a multidisciplinary approach at the intersection of nanotechnology and materials engineering.
What you'll do
- Develop and optimize ultrathin conductive layers (<10 nm) using Atomic Layer Deposition (ALD) for electrode applications.
- Investigate ALD precursors and their impact on material properties and deposition processes.
- Characterize physico-chemical, morphological, and electrochemical properties of the developed materials.
- Integrate ALD-based electrode layers into 3D devices and evaluate their performance.
- Collaborate with interdisciplinary teams to advance the integration of nanoscale materials into functional devices.
- Publish research findings in peer-reviewed journals and present results at international conferences.
Requirements
Degree required: Master's degree (or equivalent) in Materials Science, Chemistry, Physics, Nanotechnology, or a related field.
Degree offered: PhD
Language: English proficiency (no specific test score required); French proficiency not required
Instruction: French (for some administrative tasks); English (for research and supervision)
- Experience with Atomic Layer Deposition (ALD) techniques
- Knowledge of thin-film material characterization (e.g., SEM, TEM, XPS, electrochemical analysis)
- Familiarity with nanoscale material synthesis and processing
- Strong background in materials science or related disciplines
- Proficiency in scientific research methodologies and data analysis
- Open to international applicants
- No specific nationality restrictions
- No prior residency or age limits mentioned
Funding & terms
How to apply
Deadline: 2026-11-30
Applicants must submit their application through the Campus France portal for doctoral studies. The application should include a CV, a cover letter, academic transcripts, and a research proposal related to the project. Additional documents may be requested depending on the evaluation process.
- CV
- Cover letter
- Academic transcripts (BSc + MSc)
- Research proposal
- Letter of motivation
Contact
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